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Directed Self-assembly of Block Co-polymers for Nano-manufacturing
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Directed Self-assembly of Block Co-polymers for Nano-manufacturing

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3,015.00 EGP 

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Category Type
Nanotechnology
ISBN
9780081002506
Author
Roel Gronheid. Paul Nealey
Publisher
Elsevier
Description:

  • The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate ...

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9780081002506 

PRODUCT INFORMATION

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    Specifications

    Category Type
    Nanotechnology
    ISBN
    9780081002506
    Item EAN
    2724834692146
    People
    Author
    Roel Gronheid. Paul Nealey
    People
    Publisher
    Elsevier
    Category Type
    Nanotechnology
    ISBN
    9780081002506
    Item EAN
    2724834692146
    People
    Author
    Roel Gronheid. Paul Nealey
    People
    Publisher
    Elsevier
    Technical Information
    Binding
    Paperback
    Languages and countries
    Book Language
    English
    Read more
  •  

    Description:

    • The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for
    • The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new processing methods for DSA. Part 2 then goes on to outline the key modelling and characterization principles of DSA, reviewing templates and patterning using topographical and chemically modified surfaces, line edge roughness and dimensional control, x-ray scattering for characterization, and nanoscale driven assembly. Finally, Part 3 discusses application areas and related issues for DSA in nano-manufacturing, including for basic logic circuit design, the inverse DSA problem, design decomposition and the modelling and analysis of large scale, template self-assembly manufacturing techniques
 

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