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Optical Lithography Here is Why By Burn J. Lin
855.00 EGP

Optical Lithography Here is Why By Burn J. Lin

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855.00 EGP 

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Category Type
Physics
ISBN
9780819475602
Author
Burn J. Lin
Publisher
Spie Press
Description:

  • Book Name: Optical Lithography : Here is Why
  • Author: Burn J. Lin
  • ISBN: 9780819475602
  • Publisher:Spie Press
  • Description: This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive ...

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PRODUCT INFORMATION

  •  

    Specifications

    Category Type
    Physics
    ISBN
    9780819475602
    EAN-13
    9780819475602
    Item EAN
    2724588907466
    People
    Author
    Burn J. Lin
    Category Type
    Physics
    ISBN
    9780819475602
    EAN-13
    9780819475602
    Item EAN
    2724588907466
    People
    Author
    Burn J. Lin
    People
    Publisher
    Spie Press
    Technical Information
    Binding
    Paperback
    Languages and countries
    Book Language
    English
    Read more
  •  

    Description:

    • Book Name: Optical Lithography : Here is Why
    • Author: Burn J. Lin
    • ISBN: 9780819475602
    • Publisher:Spie Press
    • Description: This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a
    • Book Name: Optical Lithography : Here is Why
    • Author: Burn J. Lin
    • ISBN: 9780819475602
    • Publisher:Spie Press
    • Description: This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. Topics covered in this title include: Exposure Systems; Image Formation; The Meter of Lithography; Components in Optical Lithography; Processing and Optimization; Immersion Lithography; and, Outlook for optical lithography. Burn Lin is editor-in-chief of the ""Journal of Micro/Nanolithography"", MEMS, and MOEMS, past chair of the ""SPIE Advanced Lithography"" symposium, author of two book chapters and over 75 articles, and holder of 37 U.S. patents.
 

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